Synthesis of hyperbranched polyacetals via an+b2-type polyaddition (n=3, 8, 18, and 21): Candidate resists for extreme ultraviolet lithography

被引：11

作者：

Kudo, Hiroto ^{[1
]}

Matsubara, Shuhei ^{[1
]}

Yamamoto, Hiroki ^{[2
]}

Kozawa, Takahiro ^{[2
]}

机构：

[1] Kansai Univ, Fac Chem Mat & Bioengn, Dept Chem & Mat Engn, Suita, Osaka 5648680, Japan

[2] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan

来源：

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY | 2015年 / 53卷 / 20期

关键词：

addition polymerization; degradation; electron beam; extreme ultraviolet; hyperbranched polyacetal; polyaddition; photoresists; synthesis; NORIA; DERIVATIVES; POLYMERS;

D O I：

10.1002/pola.27686

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Polyaddition (A(n)+B-2) reactions of 1,1,1-tris(4-hydoxyphenyl) ethane (THPE; A(3)-type monomer), calix[4]resorcinarene (CRA[4]; A(8)-type monomer), -cyclodextrin (-CD; A(18)-type monomer), and -cyclodextrin (-CD; A(21)-type monomer) with 1,4-bis(4-vinyloxy)cyclohexane (BVOC; B-2-type monomer) afforded corresponding soluble hyperbranched polyacetals. The physical properties, including solubility, thermal stability, and film-forming ability, the ultraviolet-induced degradation reactivity, and the solubility-switch in an extreme ultraviolet (EUV) exposure tool indicated that poly(THPE-co-BVOC) and poly(CRA[4]-co-BVOC) are candidate next-generation photo-resists. (c) 2015 Wiley Periodicals, Inc. J. Polym. Sci., Part A: Polym. Chem. 2015, 53, 2343-2350

引用

页码：2343 / 2350

页数：8

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