Preparation and characterization of gasochromic thin films

被引：15
作者：
Vitry, V [1 ]
Renaux, F
Gouttebaron, R
Dauchot, JP
Hecq, M
机构：
[1] Mat Nova, Mons, Belgium
[2] Univ Mons, Serv Chim Inorgan & Anal, B-7000 Mons, Belgium
来源：
THIN SOLID FILMS | 2006年 / 502卷 / 1-2期
关键词：
optical coatings; sputtering; tungsten oxide; gasochromic devices;
D O I：
10.1016/j.tsf.2005.07.293
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Gasochromic devices consisting of tungsten oxide, covered by a platinum catalyst thin film were produced by reactive DC magnetron sputtering. The influence of the deposition parameters on their properties was studied. The film stoichiometry was investigated by in situ XPS analysis and the microstructure by SEM analysis. Those two features were correlated to both oxygen partial pressure and total pressure during deposition. The optical efficiency of the films is discussed as a function of stoichiometry, microstructure, and deposition parameters. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：265 / 269
页数：5
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