Amorphous/crystalline silicon heterojunction solar cells via remote inductively coupled plasma processing

被引：23

作者：

Xiao, S. Q. ^{[1
,2
]}

Xu, S. ^{[1
,2
]}

Zhou, H. P. ^{[1
,2
]}

Wei, D. Y. ^{[1
,2
]}

Huang, S. Y. ^{[1
,2
]}

Xu, L. X. ^{[1
,2
]}

Sern, C. C. ^{[1
,2
]}

Guo, Y. N. ^{[1
,2
]}

Khan, S. ^{[1
,2
]}

机构：

[1] Nanyang Technol Univ, Plasma Sources & Applicat Ctr, NIE, Singapore 637616, Singapore

[2] Nanyang Technol Univ, Inst Adv Studies, Singapore 637616, Singapore

来源：

APPLIED PHYSICS LETTERS | 2012年 / 100卷 / 23期

关键词：

CHEMICAL-VAPOR-DEPOSITION; AMORPHOUS-SILICON;

D O I：

10.1063/1.4721642

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Low-frequency inductively coupled plasma (ICP) has been widely used to deposit amorphous or microcrystalline Si thin films, but the intrinsic drawback namely ion bombardment effect limits its application in Si heterojunction solar cells. In this letter, we redesigned typical ICP and realized a remote plasma deposition with suppressed ion bombardment effect. This remote ICP system enables the synthesis of high quality amorphous Si layers with a compact network and a high hydrogen content (10.5%). By using this remote ICP system, we achieved amorphous/crystalline silicon heterojunction solar cells with an efficiency of 14.1% without any back surface field or textures. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4721642]

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