A MEMS shield structure for controlling pull-in forces and obtaining increased pull-in voltages

被引:13
作者
Busta, H
Amantea, R
Furst, D
Chen, JM
Turowski, M
Mueller, C
机构
[1] Sarnoff Corp, Princeton, NJ 08543 USA
[2] CFD Res Corp, Huntsville, AL 35805 USA
关键词
D O I
10.1088/0960-1317/11/6/315
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
By interposing a conductive shield with an opening between the movable microelectromechanical systems (MEMS) component and the substrate, it is possible to control pull-in forces and to increase pull-in voltages. Modeling results for different opening diameters are presented for a planar structure and one that contains a field emitter tip. Pull-in voltages can be increased from about 2 V (with no shield) to about 12 V with a 7 mum diameter shield hole and to 25 V with a 2 mum shield hole. This shield technology will be demonstrated on a MEMS-activated field emitter amplifier in which the gate plate of a field emitter array is thermally activated and moves with respect to the stationary tips. For a 6.7 mum diameter shield hole, the pull-in voltage is 30 V. This higher voltage, as compared to the modeling results, is caused by built-in stresses that curve the gate cantilever away from the substrate. In order for this concept to work, the field emitter operating voltage has to be smaller than the gate pull-in voltage.
引用
收藏
页码:720 / 725
页数:6
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