In situ TEM observations on the structural evolution of a nanocrystalline W-Ti alloy at elevated temperatures

被引:13
作者
Callisti, M. [1 ]
Tichelaar, F. D. [2 ]
Polcar, T. [3 ]
机构
[1] Univ Cambridge, Dept Mat Sci & Met, 27 Charles Babbage Rd, Cambridge CB3 0FS, England
[2] Delft Univ Technol, Kavli Inst Nanosci, NL-2628 CJ Delft, Netherlands
[3] Univ Southampton, Fac Engn & Environm, Natl Ctr Adv Tribol Southampton, Southampton SO17 1BJ, Hants, England
基金
“创新英国”项目; 英国工程与自然科学研究理事会;
关键词
Physical vapour deposition (PVD); High-temperature alloys; Phases separation; In situ TEM heating; THIN-FILMS; MECHANICAL-BEHAVIOR; TUNGSTEN MATERIALS; PHASE-SEPARATION; MICROSTRUCTURE; STABILITY; SEGREGATION; MULTILAYERS; IRRADIATION; STRESS;
D O I
10.1016/j.jallcom.2018.03.335
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The thermal stability and nanoscale structural evolution at elevated temperatures of a sputter deposited W-Ti alloy thin film were studied by a combination of ex situ and in situ techniques. XRD, FIB, SEM-EDX and STEM-EDX were used to characterise the film annealed ex situ in vacuum at 1373 K for 48 h. In situ TEM heating experiments were conducted at various temperatures up to 923 K to capture transitional phenomena occurring in the alloy upon heating and cooling. At a microscopic level, the alloy annealed at 1373 K for 48 h transformed from a single-phase beta-(WTi) solid solution into a two-phase alloy consisting of Ti-rich grains in equilibrium with Ti-depleted beta-(WTi) solid solution grains. In situ TEM observations revealed initial Ti segregations along columnar grain boundaries at T similar to 423-573 K, followed by Ti-rich clusters formation in the grains interior at T similar to 573-773 K. The microstructure observed at 923 K remained stable upon cooling to room temperature and consisted of Ti-rich segregations along the columnar grain boundaries and of alternate Ti-rich and Ti-depleted nanoscale domains in the grains interior, which formed a stable dual-phase nanocrystalline structure. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:1000 / 1008
页数:9
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