Microchemical and microstructural changes of Co cemented WC induced by ion implantation

被引:5
作者
Lin, WL [1 ]
Sang, JM
Ding, XJ
Xu, J
Yuan, XM
机构
[1] Beijing Normal Univ, Inst Low Energy Nucl Phys, Key Lab Radiat Beam Technol & Mat Modificat, Beijing 100875, Peoples R China
[2] Beijing Gen Res Inst NonFerrous Met, Natl Engn Technol Res Ctr Nonferrous Met Composit, Beijing 100088, Peoples R China
关键词
microchemistry; microstructure; WC-Co hard alloy; ion implantation;
D O I
10.1016/S0168-583X(01)01089-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Changes in the microchemistry and microstructure of cobalt cemented tungsten carbide (WC-Co) hard alloy which were implanted with energetic Ta ions. with and without an additional C ion beam, have been investigated. Ion implantation was carried out at room temperature using a metal vapor vacuum are source ion implanter. The extraction voltage and average current density of the ion beam was 45 kV and 50 muA/cm(2). respectively, The concentration depth profiles and microstructure of implanted the WC-Co alloy were analyzed by Rutherford backscattering spectroscopy. Auger electron spectroscopy. and glancing angle X-ray diffraction. respectively. The results showed that as compared with the control. there were no significant microstructural changes in the tungsten carbide phase of implanted WC-Co alloy substrates both Ta implantation and Ta + C dual implantation induced a transformation from a metastable cubic form to a stable hcp form of cobalt binder phase, (C) 2002 Published by Elsevier Science B.V.
引用
收藏
页码:201 / 204
页数:4
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