In situ RBS measurements for the effect of swift heavy ion irradiation on metal-insulator interfaces

被引:3
作者
Hayashi, M. [1 ]
Matsuda, M. [2 ]
Asozu, T. [2 ]
Sataka, M. [2 ]
Nakamura, M. [2 ]
Iwase, A. [1 ]
机构
[1] Osaka Prefecture Univ, Dept Mat Sci, Sakai, Osaka 5998531, Japan
[2] Japan Atom Energy Agcy, Tokai, Ibaraki 3191195, Japan
关键词
In situ RBS; Atomic mixing; Electronic excitation; Metal-insulator interfaces; Swift heavy ions; DIFFUSION; CRYSTAL;
D O I
10.1016/j.nimb.2013.05.046
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We have studied the effect of 200 MeV Xe ion irradiation on Bi-Al2O3 and Au-Al2O3 interfaces by means of in situ Rutherford backscattering spectrometry (RBS). For the Bi-Al2O3 interface, we could observe a systematic change in RBS spectrum as a function of Xe ion fluence or the irradiation time. On the other hand, for Au-Al2O3 system, we could not observe any change in RBS spectrum. The experimental result confirmed our previous result that atomic mixing at Bi-Al2O3 interface surely occurs by the Xe ion irradiation. We analyzed the RBS spectra by the simulation software SIMNRA, and discussed the Bi-Al2O3 mixing quantitatively. From the irradiation time dependence of the mixing layer thickness, we estimated the effective diffusion constant for the atomic mixing at Bi-Al2O3 interface. Its value corresponds to the self-diffusion near the melting temperature of Al2O3. The result implies that Bi and Al2O3 are in molten forms during the ion irradiation, resulting in the atomic mixing at Bi-Al2O3 interface. (C) 2013 Published by Elsevier B.V.
引用
收藏
页码:176 / 179
页数:4
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