High-Gain Millimeter-Wave AlGaN/GaN Transistors

被引:13
作者
Schwantuschke, Dirk [1 ]
Brueckner, Peter [1 ]
Quay, Ruediger [1 ]
Mikulla, Michael [1 ]
Ambacher, Oliver [1 ]
机构
[1] Fraunhofer Inst Appl Solid State Phys IAF, D-79108 Freiburg, Germany
关键词
Aluminum gallium nitride; Gallium nitride; millimeter wave devices; millimeter wave technology; transistors; BUFFER LEAKAGE; POWER; GROWTH; EPITAXY; HEMT; GAN;
D O I
10.1109/TED.2013.2272180
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the fabrication and performance of common-source (CS) and common-gate transistors for operation at millimeter-wave frequencies are presented. The AlGaN/GaN devices have a gate length of 100 nm and yield a high maximum transconductance of above 550 mS/mm with a very low contact resistance of less than 0.12 Omega.mm. The baseline technology with its optimized epitaxial structures and their transition frequency of more than 80 GHz allows reproducible designs for monolithic microwave integrated circuits up to the W-band frequency range (75-110 GHz). In addition, GaN dualgate (DG) devices were developed for substantial improvement of the bandwidth of the devices and of the gain per stage on circuit level. This paper discusses the advantages of the DG devices in power gain over the CS high electron mobility transistors for millimeter-wave applications.
引用
收藏
页码:3112 / 3118
页数:7
相关论文
共 17 条
  • [1] [Anonymous], 2010, HRXRD SOFTW LEPTOS
  • [2] Development of 100 nm gate AlGaN/GaN HEMT and MMIC technology suitable for mm-wave applications
    Brueckner, Peter
    Kiefer, R.
    Haupt, C.
    Leuther, A.
    Mueller, S.
    Quay, R.
    Schwantuschke, D.
    Mikulla, M.
    Ambacher, O.
    [J]. PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 9, NO 3-4, 2012, 9 (3-4): : 903 - 906
  • [3] Development of a high transconductance GaN MMIC technology for millimeter wave applications
    Haupt, C.
    Maroldt, S.
    Quay, R.
    Pletschen, W.
    Leuther, A.
    Ambacher, O.
    [J]. PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 8, NO 2, 2011, 8 (02): : 297 - 299
  • [4] Growth of Fe doped semi-insulating GaN by metalorganic chemical vapor deposition
    Heikman, S
    Keller, S
    DenBaars, SP
    Mishra, UK
    [J]. APPLIED PHYSICS LETTERS, 2002, 81 (03) : 439 - 441
  • [5] Growth and electrical properties of AlxGa1-xN/GaN heterostructures with different Al-content
    Koehler, K.
    Mueller, S.
    Waltereit, P.
    Kirste, L.
    Menner, H. P.
    Bronner, W.
    Quay, R.
    [J]. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2009, 206 (11): : 2652 - 2657
  • [6] Margomenos A, 2012, EUR MICROW INTEGRAT, P199
  • [7] Micovic M, 2006, INT EL DEVICES MEET, P157
  • [8] Micovic M, 2010, IEEE MTT S INT MICR, P237, DOI 10.1109/MWSYM.2010.5516911
  • [9] Pahl P, 2013, EUR MICROW CONF, P1383
  • [10] Effect of AlN nucleation layer growth conditions on buffer leakage in AlGaN/GaN high electron mobility transistors grown by molecular beam epitaxy (MBE)
    Poblenz, C
    Waltereit, P
    Rajan, S
    Mishra, UK
    Speck, JS
    Chin, R
    Smorchkova, I
    Heying, B
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (04): : 1562 - 1567