Microstructure and electrochemical behavior of sputtered diamond-like carbon films

被引：7
作者：
Zeng, A
Liu, E
Hing, P
Zhang, S
Tan, SN
Annergren, IF
Gao, J
机构：
[1] Nanyang Technol Univ, Sch Mech & Prod Engn, Singapore 639798, Singapore
[2] Nanyang Technol Univ, Sch Mat Engn, Singapore 639798, Singapore
[3] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore
[4] Gint Inst Mfg Technol, Singapore 638075, Singapore
来源：
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2002年 / 16卷 / 6-7期
关键词：
D O I：
10.1142/S0217979202010804
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Diamond-like carbon (DLC) films with different structure were deposited on highly electrically conductive silicon substrates (SiO2/Si), using dc magnetron sputtering deposition process. Their structure and electrochemical behavior in 0.5 M H2SO4 Solution were studied with micro-Raman spectroscopy, electrochemical impedance spectroscopic (EIS) analysis and film impedance. The double layer capacitance on the DLC films was about 0.571 - 3.91 muF-cm(2). The capacitance increased with the increased Raman spectrum intensity ratio I-D/I-G and accelerated at around 2.25 of the ratio. The results suggest that the potential of DLC films as electrode materials for electrochemical analysis.
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收藏
页码：1024 / 1030
页数：7
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