Femtosecond laser assisted etching of quartz: microstructuring from inside

被引：43
|
作者：
Matsuo, S.
Tabuchi, Y.
Okada, T.
Juodkazis, S.
Misawa, H.
机构：
[1] Univ Tokushima, Fac Engn, Tokushima 7708506, Japan
[2] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido 0010021, Japan
[3] CREST, JST, Kawaguchi, Saitama, Japan
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2006年 / 84卷 / 1-2期
关键词：
D O I：
10.1007/s00339-006-3603-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In quartz crystal substrates, microchannels were made by femtosecond laser assisted etching, i.e., irradiation of focused femtosecond laser pulses followed by wet etching. By the use of wet etching, the laser irradiated region was selectively etched out, and a microchannel was formed inside the quartz substrate. The laser irradiated region was found to be amorphous by transmission electron microscopy. Anisotropy in the etching rate inside the quartz was observed.
引用
收藏
页码：99 / 102
页数：4
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