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Removal of Emerging Contaminants by Fenton and UV-Driven Advanced Oxidation Processes
被引:25
作者:
Lucas, Marco S.
[1
]
Peres, Jose A.
[1
]
机构:
[1] Univ Tras Os Montes & Alto Douro, Dept Quim, Ctr Quim Vila Real, P-5000801 Vila Real, Portugal
关键词:
Fenton reagent;
Parabens;
Photo-Fenton;
UVirradiation;
UV/H2O2;
WATER;
ENVIRONMENT;
PHARMACEUTICALS;
PRESERVATIVES;
DEGRADATION;
D O I:
10.1007/s11270-015-2534-z
中图分类号:
X [环境科学、安全科学];
学科分类号:
08 ;
0830 ;
摘要:
The removal efficiencies of four different parabens (methylparaben (MP), ethylparaben (EP), propylparaben (PP), and butylparaben (BP)) using Fenton reagent, UV irradiation, UV/H2O2, and UV/H2O2/Fe2+ were evaluated to assess the level of paraben degradation achieved using different advanced oxidation processes (AOPs). UV irradiation by itself provided paraben conversions between 27 and 38 % after a reaction time of 180 min. The UV/H2O2 system increased the paraben conversion to values between 62 and 92 %, and the Fenton process was revealed as inefficient in paraben degradation within the experimental conditions used. Photo-Fenton presented similar removal rates to the UV/H2O2 process. Among the four parabens studied, butylparaben was the most easily removed, and it was possible to attain degradations higher than 90 %. In the UV/H2O2 and photo-Fenton processes, the overall kinetic constant could be split into two main components: direct oxidation by UV radiation (photolysis) and oxidation by free radicals (mainly HO center dot) generated from the photodecomposition of H2O2. This work reveals that UV-driven oxidation processes can be widely used to remove parabens from contaminated aqueous solutions.
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