Thermal properties of poly(neopentylmethacrylate) thin films deposited via solventless, radical initiated chemical vapor deposition

被引:5
作者
Jeevendrakumar, Vijay Jain Bharamaiah [1 ]
Altemus, Bruce A. [2 ]
Gildea, Adam J. [2 ]
Bergkvist, Magnus [1 ]
机构
[1] SUNY Albany, Coll Nanoscale Sci & Engn, Albany, NY 12203 USA
[2] Tokyo Electron US Holdings Inc, US Technol Dev Ctr, Austin, TX 78741 USA
关键词
Initiated chemical vapor deposition; Spectroscopic ellipsometry; Glass transition temperature; Thermal degradation; Gel-permeation chromatography; GLASS-TRANSITION TEMPERATURE; POLY(METHYL METHACRYLATE); MOLECULAR-WEIGHT; POLYMER; DEGRADATION; ICVD; DEPENDENCE; EXPANSION; THICKNESS; KINETICS;
D O I
10.1016/j.tsf.2013.06.056
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper investigates the thermal properties of thin films of poly(neopentylmethacrylate) (PnPMA) deposited via solventless, radical initiated chemical vapor deposition (iCVD). The effects of monomer to initiator molar ratio (MA) on deposition kinetics, thermal properties and composition of the film were investigated. The molecular weight and conversion of PnPMA were observed to increase with increasing initiator concentration. Thermal properties of the film stabilized when annealed to 150 degrees C which was attributed to removal of short-chain molecules acting as "plasticizers". Gel-permeation chromatography (GPC) studies and non-linear regression analysis of GPC data confirmed these results. MA had no significant effect on the thermal stability of iCVD PnPMA and we hypothesize that this behavior is primarily due to weak bond linkages formed during polymer chain termination. The activation energy for the final thermal degradation stage of iCVD PnPMA was similar to that of anionically polymerized PnPMA, indicating that the iCVD polymer at this point was primarily composed of stable polymers that degrade through random chain scission. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:81 / 86
页数:6
相关论文
共 40 条
[1]   Kinetics of the isothermal degradation of model polymers containing ether, ketone and sulfone groups [J].
Abate, L ;
Blanco, I ;
Orestano, A ;
Pollicino, A ;
Recca, A .
POLYMER DEGRADATION AND STABILITY, 2005, 87 (02) :271-278
[2]   Chemical Vapor Deposition of Conformal, Functional, and Responsive Polymer Films [J].
Alf, Mahriah E. ;
Asatekin, Ayse ;
Barr, Miles C. ;
Baxamusa, Salmaan H. ;
Chelawat, Hitesh ;
Ozaydin-Ince, Gozde ;
Petruczok, Christy D. ;
Sreenivasan, Ramaswamy ;
Tenhaeff, Wyatt E. ;
Trujillo, Nathan J. ;
Vaddiraju, Sreeram ;
Xu, Jingjing ;
Gleason, Karen K. .
ADVANCED MATERIALS, 2010, 22 (18) :1993-2027
[4]  
Asatekin A., 2011, ACS S SERIESACS, P39
[5]   Polymeric Nanopore Membranes for Hydrophobicity-Based Separations by Conformal Initiated Chemical Vapor Deposition [J].
Asatekin, Ayse ;
Gleason, Karen K. .
NANO LETTERS, 2011, 11 (02) :677-686
[6]   Initiated chemical vapour deposition (iCVD) of thermally stable poly-glycidyl methacrylale [J].
Bakker, R. ;
Verlaan, V. ;
van der Werf, C. H. M. ;
Rath, J. K. ;
Gleasonb, K. K. ;
Schropp, R. E. I. .
SURFACE & COATINGS TECHNOLOGY, 2007, 201 (22-23) :9422-9425
[7]   Synthesis of poly(meta-diethynyl benzene) with initiated chemical vapour deposition [J].
Bakker, R. ;
Weijers, P. ;
Spee, D. A. ;
van Steenbergen, M. J. ;
van der Werf, C. H. M. ;
Rath, J. K. ;
Schropp, R. E. I. .
THIN SOLID FILMS, 2011, 519 (14) :4418-4420
[8]   ELLIPSOMETRIC STUDY OF THE GLASS-TRANSITION AND THERMAL-EXPANSION COEFFICIENTS OF THIN POLYMER-FILMS [J].
BEAUCAGE, G ;
COMPOSTO, R ;
STEIN, RS .
JOURNAL OF POLYMER SCIENCE PART B-POLYMER PHYSICS, 1993, 31 (03) :319-326
[9]   Single-Step Oxidative Chemical Vapor Deposition of -COOH Functional Conducting Copolymer and Immobilization of Biomolecule for Sensor Application [J].
Bhattacharyya, Dhiman ;
Gleason, Karen K. .
CHEMISTRY OF MATERIALS, 2011, 23 (10) :2600-2605
[10]   Air-gap fabrication using a sacrificial polymeric thin film synthesized via initiated chemical vapor deposition [J].
Chan, K ;
Gleason, KK .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2006, 153 (04) :C223-C228