Breakdown and crystallization processes in niobium oxide films in oxalic acid solution

被引：22

作者：

Freitas, MBJG ^{[1
]}

Bulhoes, LOS ^{[1
]}

机构：

[1] UNIV FED SAO CARLOS,DEPT QUIM,LAB INTERDISCIPLINAR ELETROQUIM & CERAM,BR-13565905 SAO CARLOS,SP,BRAZIL

来源：

JOURNAL OF APPLIED ELECTROCHEMISTRY | 1997年 / 27卷 / 05期

基金：

巴西圣保罗研究基金会;

关键词：

D O I：

10.1023/A:1018415215961

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：612 / 615

页数：4

共 12 条

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[2]

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BULHOES, LOD .

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[6]

HALBRITER J, 1980, J APPL PHYS, V51, P397

[7] THEORY OF ELECTRICAL BREAKDOWN DURING FORMATION OF BARRIER ANODIC FILMS [J].

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[8]

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[9] SOME PARAMETERS AFFECTING GALVANOSTATIC FORMATION OF ANODIC FILMS ON TITANIUM IN ACID-MEDIA [J].

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[10]

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