Controlled positioning of nanoparticles on a micrometer scale

被引：5

作者：

Enderle, Fabian ^{[1
]}

Dubbers, Oliver ^{[1
]}

Plettl, Alfred ^{[1
]}

Ziemann, Paul ^{[1
]}

机构：

[1] Univ Ulm, Inst Solid State Phys, D-89069 Ulm, Germany

来源：

BEILSTEIN JOURNAL OF NANOTECHNOLOGY | 2012年 / 3卷

关键词：

electron beam lithography; nanoparticles; positioning; self-assembling; unconventional lithography; ORDERED ARRAYS; NANOSTRUCTURES;

D O I：

10.3762/bjnano.3.86

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

For many applications it is desirable to have nanoparticles positioned on top of a given substrate well separated from each other and arranged in arrays of a certain geometry. For this purpose, a method is introduced combining the bottom-up self-organization of precursor-loaded micelles providing Au nanoparticles (NPs), with top-down electron-beam lithography. As an example, 13 nm Au NPs are arranged in a square array with interparticle distances >1 mu m on top of Si substrates. By using these NPs as masks for a subsequent reactive ion etching, the square pattern is transferred into Si as a corresponding array of nanopillars.

引用

页码：773 / 777

页数：5

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