Atomic layer deposition

被引：3
|
作者：
Godlewski, Marek [1 ]
机构：
[1] Polish Acad Sci, Inst Phys, Warsaw, Poland
来源：
SEMICONDUCTOR SCIENCE AND TECHNOLOGY | 2012年 / 27卷 / 07期
关键词：
D O I：
10.1088/0268-1242/27/7/070301
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页数：1
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