Spirothiopyran based photoresists for large area 2D and 3D sub-diffraction nanopatterning

被引：0
|
作者：
Vijayamohanan, Harikrishnan [1 ]
Ullal, Chaitanya [1 ]
机构：
[1] Rensselaer Polytech Inst, Mat Sci & Engn, Troy, NY USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2017年 / 254卷
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暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
496
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页数：1
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