Spirothiopyran based photoresists for large area 2D and 3D sub-diffraction nanopatterning

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作者
Vijayamohanan, Harikrishnan [1 ]
Ullal, Chaitanya [1 ]
机构
[1] Rensselaer Polytech Inst, Mat Sci & Engn, Troy, NY USA
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O6 [化学];
学科分类号
0703 ;
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496
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页数:1
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