High Temperature Operation of Al0.45Ga0.55N/Al0.30Ga0.70N High Electron Mobility Transistors

被引:26
|
作者
Baca, Albert G. [1 ]
Armstrong, Andrew M. [1 ]
Allerman, Andrew A. [1 ]
Klein, Brianna A. [1 ]
Douglas, Erica A. [1 ]
Sanchez, Carlos A. [1 ]
Fortune, Torben R. [1 ]
机构
[1] Sandia Natl Labs, POB 5800, Albuquerque, NM 87185 USA
关键词
ALGAN/GAN HEMTS;
D O I
10.1149/2.0041711jss
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
AlGaN-channel high electron mobility transistors (HEMTs) are among a class of ultra wide-bandgap transistors that have a bandgap greater than similar to 3.4 eV, beyond that of GaN and SiC, and are promising candidates for RF and power applications. Long-channel AlxGa1-xN HEMTs with x = 0.3 in the channel have been built and evaluated across the -50 degrees C to + 200 degrees C temperature range. Room temperature drain current of 70 mA/mm, absent of gate leakage, and with a modest -1.3 V threshold voltage was measured. A very large I-on/I-off current ratio, greater than 10(8) was demonstrated over the entire temperature range, indicating that off-state leakage is below the measurement limit even at 200 degrees C. Combined with near ideal subthreshold slope factor that is just 1.3x higher than the theoretical limit across the temperature range, the excellent leakage properties are an attractive characteristic for high temperature operation. (c) The Author(s) 2017. Published by ECS. All rights reserved.
引用
收藏
页码:S3010 / S3013
页数:4
相关论文
共 50 条
  • [21] HVPE growth of thick Al0.45Ga0.55N layers on trench patterned sapphire substrates
    Hagedorn, Sylvia
    Richter, Eberhard
    Zeimer, Ute
    Weyers, Markus
    PHYSICA STATUS SOLIDI C: CURRENT TOPICS IN SOLID STATE PHYSICS, VOL 10, NO 3, 2013, 10 (03): : 355 - 358
  • [22] High-temperature photoluminescence and photoluminescence excitation spectroscopy of Al0.60Ga0.40N/Al0.70Ga0.30N multiple quantum wells
    Murotani, Hideaki
    Nakamura, Katsuto
    Fukuno, Tomonori
    Miyake, Hideto
    Hiramatsu, Kazumasa
    Yamada, Yoichi
    APPLIED PHYSICS EXPRESS, 2017, 10 (02)
  • [23] Mean multiplication gain and excess noise factor of GaN and Al0.45Ga0.55N avalanche photodiodes
    Ooi, Tat Lung Wesley
    Cheang, Pei Ling
    You, Ah Heng
    Chan, Yee Kit
    EUROPEAN PHYSICAL JOURNAL-APPLIED PHYSICS, 2020, 92 (01):
  • [24] Improved In0.45Al0.55As/In0.45Ga0.55As/In0.65Ga0.35As inverse composite channel metamorphic high electron mobility transistor
    Chen, YJ
    Lee, CS
    Wang, TB
    Hsu, WC
    Chen, YW
    Su, KH
    Wu, CL
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (08): : 5903 - 5908
  • [25] Electrical characteristics of Pt/Au Schottky contacts to plasma-etched Al0.45Ga0.55N
    Cheng, Caijing
    Si, Junjie
    PHYSICA B-CONDENSED MATTER, 2011, 406 (15-16) : 3098 - 3100
  • [26] Defect reduction in Si-doped Al0.45Ga0.55N films by SiNx interlayer method
    Li, Yang
    Chen, Shengchang
    Kong, Man
    Li, Senlin
    Tian, Wu
    Sun, Shichuang
    Wu, Zhihao
    Fang, Yanyan
    Dai, Jiangnan
    Chen, Changqing
    JOURNAL OF APPLIED PHYSICS, 2014, 115 (04)
  • [27] Effect of Annealing on the Characteristics of Pd/Au Contacts to p-Type GaN/Al0.45Ga0.55N
    Y. Bai
    J. Liu
    H.J. Shen
    P. Ma
    X.Y. Liu
    L.W. Guo
    Journal of Electronic Materials, 2012, 41 : 3021 - 3026
  • [28] Effect of Annealing on the Characteristics of Pd/Au Contacts to p-Type GaN/Al0.45Ga0.55N
    Bai, Y.
    Liu, J.
    Shen, H. J.
    Ma, P.
    Liu, X. Y.
    Guo, L. W.
    JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (11) : 3021 - 3026
  • [29] Investigation of gate leakage mechanism in Al2O3/Al0.55Ga0.45N/GaN metal-oxide-semiconductor high-electron-mobility transistors
    Zhu, Jie-Jie
    Ma, Xiao-Hua
    Hou, Bin
    Chen, Wei-Wei
    Hao, Yue
    APPLIED PHYSICS LETTERS, 2014, 104 (15)
  • [30] Effects of AlN/GaN Superlattices on the Structural Properties of Al0.45Ga0.55N Grown on AlN/Sapphire Templates
    Fu, Q. M.
    Peng, T.
    Pan, Y.
    Liu, C.
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2009, 55 (06) : 2659 - 2661