Optimized Performance of 808 nm Diode Laser Bars for Efficient High-Power Operation

被引:0
作者
Bai, J. G. [1 ]
Bao, L. [1 ]
Dong, W. [1 ]
Guan, X. [1 ]
Elim, S. [1 ]
Zhang, S. [1 ]
Patternson, J. [1 ]
Grimshaw, M. [1 ]
DeVito, M. [1 ]
Kanskar, M. [1 ]
Martinsen, R. [1 ]
Haden, J. [1 ]
机构
[1] nLIGHT Corp, Vancouver, WA 98665 USA
来源
HIGH-POWER DIODE LASER TECHNOLOGY AND APPLICATIONS XI | 2013年 / 8605卷
关键词
Diode lasers; High power; High efficiency; Continuous wave operation; 808; nm; Centimeter bar; Laser modeling; Semiconductor lasers;
D O I
10.1117/12.2005479
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
nLIGHT optimized both the high-temperature (HT) and the high-efficiency (HE) epitaxial designs for efficient high-power continuous-wave (CW) operation by implementing nLIGHT's facet passivation technology (nXLT) into our 808 nm diode laser bars. The application of a refined phenomenological model of the diode lasers allowed tailoring of the device parameters to obtain optimized bar performance. In other words, we adjusted modeling inputs such as bar layout and front facet coating reflectivity to optimize operational indicator outputs such as wall-plug efficiency and operation currents at specific power ratings. Thus, both time and cost were saved without the need of extra experimental runs. We demonstrated that both HT and HE epitaxial designs can support centimeter bar geometries with power ratings above 100 W/bar. At the standard power rating of 100 W/bar, the HE designs show advantages in both operating current and wall-plug efficiency when compared to the HT design. With the newly released HE epitaxial designs, wall-plug efficiency similar to 58% is achieved for a power rating of 150 W/bar.
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页数:7
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