Direct-Write Optical Patterning of P3HT Films Beyond the Diffraction Limit

被引:38
作者
Jacobs, Ian E. [1 ]
Aasen, Erik W. [2 ]
Nowak, Derek [3 ]
Li, Jun [2 ]
Morrison, William [3 ]
Roehling, John D. [2 ,5 ]
Augustine, Matthew P. [4 ]
Moule, Adam J. [2 ,4 ]
机构
[1] Univ Calif Davis, Dept Mat Sci & Engn, One Shields Ave, Davis, CA 95616 USA
[2] Univ Calif Davis, Dept Chem Engn, One Shields Ave, Davis, CA 95616 USA
[3] Mol Vista Inc, 6840 Via Del Oro,Suite 110, San Jose, CA 95119 USA
[4] Univ Calif Davis, Dept Chem, One Shields Ave, Davis, CA 95616 USA
[5] Lawrence Livermore Natl Lab, Div Mat Sci, 7000 East Ave, Livermore, CA 94550 USA
关键词
POLYMER SOLAR-CELLS; SOFT LITHOGRAPHY; ORGANIC SEMICONDUCTORS; CONJUGATED POLYMERS; CROSS-LINKING; LARGE-AREA; EFFICIENT; DEVICES; AGGREGATION; MORPHOLOGY;
D O I
10.1002/adma.201603221
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Doping-induced solubility control is a patterning technique for semiconducting polymers, which utilizes the reduction in polymer solubility upon p-type doping to provide direct, optical control of film topography and doping level. In situ direct-write patterning and imaging are demonstrated, revealing subdiffraction-limited topographic features. Photoinduced force microscopy shows that doping level can be optically modulated with similar resolution.
引用
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页数:8
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