Compact Modeling of Complementary Switching in Oxide-Based ReRAM Devices

被引:40
|
作者
La Torre, Camilla [1 ,2 ]
Zurhelle, Alexander F. [1 ,2 ]
Breuer, Thomas [3 ,4 ]
Waser, Rainer [1 ,2 ,3 ,4 ]
Menzel, Stephan [3 ,4 ]
机构
[1] Rhein Westfal TH Aachen, Inst Werkstoffe Elektrotech 2, D-52070 Aachen, Germany
[2] Rhein Westfal TH Aachen, JARA FIT, D-52070 Aachen, Germany
[3] Peter Grunberg Inst 7, D-52425 Julich, Germany
[4] Forschungszentrum Julich, JARA FIT, D-52425 Julich, Germany
关键词
Bipolar switching (BS); compact model; complementary switching (CS); HfOx; redox-based resistive switching memories (ReRAM); resistive random access memory (RRAM); MEMORIES;
D O I
10.1109/TED.2019.2892997
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Physics-based compact models for redox-based resistive switching memory (ReRAM) devices are used to increase the physical understanding of the complex switching process as well as to allow for accurate circuit simulations. This includes that models have to cover devices showing bipolar switching (BS) and complementary switching (CS). In contrast to BS devices, which store the information in (at least) one high and one low resistance state, CS devices use (at least) two high resistance states. Applications of CS devices range from passive crossbar arrays to novel logic-in-memory concepts. The coexistence of CS and BS modes in one device has been shown experimentally. Here, a physics-based compact model describing BS and CS consistently is presented. Besides modeling CS devices, the model improves the description of BS as it allows to reproduce and explain anomalies in the BS RESET process. The model includes ion drift and diffusion along the filament. The influence of different parameters on the drift-diffusion balance is discussed.
引用
收藏
页码:1268 / 1275
页数:8
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