Physics-based compact models for redox-based resistive switching memory (ReRAM) devices are used to increase the physical understanding of the complex switching process as well as to allow for accurate circuit simulations. This includes that models have to cover devices showing bipolar switching (BS) and complementary switching (CS). In contrast to BS devices, which store the information in (at least) one high and one low resistance state, CS devices use (at least) two high resistance states. Applications of CS devices range from passive crossbar arrays to novel logic-in-memory concepts. The coexistence of CS and BS modes in one device has been shown experimentally. Here, a physics-based compact model describing BS and CS consistently is presented. Besides modeling CS devices, the model improves the description of BS as it allows to reproduce and explain anomalies in the BS RESET process. The model includes ion drift and diffusion along the filament. The influence of different parameters on the drift-diffusion balance is discussed.
机构:
Hanyang Univ, Novel Funct Mat & Device Lab, Div Nanoscale Semicond Engn, Seoul 04763, South KoreaHanyang Univ, Novel Funct Mat & Device Lab, Div Nanoscale Semicond Engn, Seoul 04763, South Korea
机构:
East China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R ChinaEast China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
Yang, Xiaoqiao
Sun, Yabin
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East China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
East China Normal Univ, Chongqing Inst, Chongqing Key Lab Precis Opt, Chongqing 401120, Peoples R ChinaEast China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
Sun, Yabin
Li, Xiaojin
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East China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R ChinaEast China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
Li, Xiaojin
Shi, Yanling
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East China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R ChinaEast China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China
Shi, Yanling
Liu, Ziyu
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Fudan Univ, Sch Microelect, Shanghai 200433, Peoples R ChinaEast China Normal Univ, Dept Elect Engn, Shanghai 200241, Peoples R China