Ablation using a pulsed UV laser: Principal approach for controlled synthesis of silicon nanostructures

被引：0
|
作者：
Patrone, L
Marine, W
Safarov, VI
Sentis, ML
机构：
[1] Fac Sci Luminy, Grp Interdisciplinaire Ablat Laser & Applicat, GPEC, UMR 6631,CNRS, F-13288 Marseille 09, France
[2] Fac Sci Luminy, Grp Interdisciplinaire Ablat Laser & Applicat, LP3, FRE 2165,CNRS, F-13288 Marseille 09, France
来源：
JOURNAL DE PHYSIQUE IV | 2001年 / 11卷 / PR7期
关键词：
D O I：
10.1051/jp4:2001737
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：119 / 120
页数：2
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