Formation of DNA damaging product from light-irradiated nonylphenol

被引：10
作者：
Okamoto, Y
Hayashi, T
Matsunami, S
Ueda, K
Toda, C
Kawanishi, S
Kojima, N
机构：
[1] Meijo Univ, Fac Pharm, Tempaku Ku, Nagoya, Aichi 4688503, Japan
[2] Mie Univ, Sch Med, Dept Environm & Mol Med, Tsu, Mie 5148507, Japan
来源：
JOURNAL OF HEALTH SCIENCE | 2006年 / 52卷 / 01期
关键词：
carcinogenesis; alkylcatechol; risk assessment; ring hydroxylation; 8-oxodG; sunlight exposure;
D O I：
10.1248/jhs.52.91
中图分类号：
R99 [毒物学（毒理学）];
学科分类号：
100405 ;
摘要：
Nonylphenol (NP) is widely distributed in the environment as a microbial metabolite of nonylphenol polyethoxylates, which are commercially important surfactants. Although there are concerns regarding the estrogenic activity of NP and its effects on wildlife, this paper reports a new detrimental effect for NP; oxidative DNA damage. After UV or sunlight irradiation, several NP photoproducts were detected by high performance liquid chromatography (HPLC). Two HPLC fractions induced formation of 8-oxo-7,8-dihydro-2'deoxyguanosine (8-oxodG) in calf thymus DNA. Based on gas chromatography/mass spectrometry and UV/ visible spectrometry one fraction was confirmed to contain 4-nonylcatechol. The other active compound remains unidentified. Non-irradiated NP did not exhibit any detectable 8-oxodG formation. These results suggest that NP induces oxidative DNA damage following environmental light exposure. This DNA damaging activity is a new adverse effect of NP and, in addition to estrogenic activity, should be investigated further and taken into consideration during NP risk assessment.
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页码：91 / 95
页数：5
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