Influence of Electrostatic Forces on the Growth of One-Dimensional Nanostructures

被引：3

作者：

Cross, Michael ^{[1
]}

Varhue, Walter ^{[1
]}

机构：

[1] Univ Vermont, Sch Engn, Burlington, VT 05405 USA

来源：

JOURNAL OF NANOMATERIALS | 2012年 / 2012卷

关键词：

RUTHENIUM DIOXIDE NANORODS; RUO2; NANORODS; OXIDE; ELECTROLYSIS; FILM;

D O I：

10.1155/2012/105782

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The growth of crystalline ruthenium oxide square nanorods was considered on numerous substrate materials. The nanorods were found to grow easily on insulating substrates, while their growth on electrically conducting and grounded substrates was inhibited. The transfer of electrons from the plasma discharge to the developing nanorods caused the nanorods to be negatively charged and obtain a floating potential relative to ground. The electrical charging of the nanorod played a key role in their development.

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页数：7

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共 23 条

[1] Initial stages of growth of heteroepitaxial yttria-stabilized zirconia films on silicon substrates [J].

Bunt, P ;

Varhue, WJ ;

Adams, E ;

Mongeon, S .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (12) :4541-4545

[2] In situ epitaxial growth of TiO2 on RuO2 nanorods with reactive sputtering -: art. no. 043115 [J].

Cheng, KW ;

Lin, YT ;

Chen, CY ;

Hsiung, CP ;

Gan, JY ;

Yeh, JW ;

Hsieh, CH ;

Chou, LJ .

APPLIED PHYSICS LETTERS, 2006, 88 (04) :1-3

[3] Radiative melting of crystalline ruthenium oxide nanorods [J].

Cross, M. W. ;

Varhue, W. J. .

NANOTECHNOLOGY, 2008, 19 (43)

[4] RuO2 nanorod coated cathode for the electrolysis of water [J].

Cross, Michael ;

Varhue, Walter ;

Pelletier, Keith ;

Stewart, Michael .

INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2012, 37 (03) :2166-2172

[5] Control of ruthenium oxide nanorod length in reactive sputtering [J].

Cross, Michael W. ;

Varhue, Walter J. ;

Hitt, Darren L. ;

Adams, Edward .

NANOTECHNOLOGY, 2008, 19 (04)

[6] Novel nanostructures of functional oxides synthesized by thermal evaporation [J].

Dai, ZR ;

Pan, ZW ;

Wang, ZL .

ADVANCED FUNCTIONAL MATERIALS, 2003, 13 (01) :9-24

[7] A new RuO4 solvent solution for pure ruthenium film depositions [J].

Gatineau, Julien ;

Yanagita, Kazutaka ;

Dussarrat, Christian .

MICROELECTRONIC ENGINEERING, 2006, 83 (11-12) :2248-2252

[8] Properties of native ultrathin aluminium oxide tunnel barriers [J].

Gloos, K ;

Koppinen, PJ ;

Pekola, JP .

JOURNAL OF PHYSICS-CONDENSED MATTER, 2003, 15 (10) :1733-1746

[9] Field emission characteristics of ruthenium dioxide nanorods [J].

Hsieh, CS ;

Wang, G ;

Tsai, DS ;

Chen, RS ;

Huang, YS .

NANOTECHNOLOGY, 2005, 16 (09) :1885-1891

[10] Preparation of ruthenium dioxide nanorods and their field emission characteristics [J].

Hsieh, CS ;

Tsai, DS ;

Chen, RS ;

Huang, YS .

APPLIED PHYSICS LETTERS, 2004, 85 (17) :3860-3862