Nanoscale Roughness and Morphology Affect the IsoElectric Point of Titania Surfaces

被引:52
作者
Borghi, Francesca [1 ,2 ]
Vyas, Varun [1 ,2 ,3 ]
Podesta, Alessandro [1 ,2 ]
Milani, Paolo [1 ,2 ]
机构
[1] Univ Milan, Interdisciplinary Ctr Nanostruct Mat & Interfaces, Milan, Italy
[2] Univ Milan, Dept Phys, Milan, Italy
[3] SEMM, Milan, Italy
关键词
AMPHIFUNCTIONALLY ELECTRIFIED INTERFACES; AQUEOUS-ELECTROLYTE SOLUTION; DOUBLE-LAYER CAPACITANCE; ATOMIC-FORCE MICROSCOPY; CLUSTER BEAM DEPOSITION; NANOSTRUCTURED TIO2; ELECTROSTATIC INTERACTIONS; ELECTROPHORETIC MOBILITY; INTERACTION ENERGY; DLVO INTERACTION;
D O I
10.1371/journal.pone.0068655
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
We report on the systematic investigation of the role of surface nanoscale roughness and morphology on the charging behaviour of nanostructured titania (TiO2) surfaces in aqueous solutions. IsoElectric Points (IEPs) of surfaces have been characterized by direct measurement of the electrostatic double layer interactions between titania surfaces and the micrometer-sized spherical silica probe of an atomic force microscope in NaCl aqueous electrolyte. The use of a colloidal probe provides well-defined interaction geometry and allows effectively probing the overall effect of nanoscale morphology. By using supersonic cluster beam deposition to fabricate nanostructured titania films, we achieved a quantitative control over the surface morphological parameters. We performed a systematical exploration of the electrical double layer properties in different interaction regimes characterized by different ratios of characteristic nanometric lengths of the system: the surface rms roughness Rq, the correlation length xi and the Debye length lambda(D). We observed a remarkable reduction by several pH units of IEP on rough nanostructured surfaces, with respect to flat crystalline rutile TiO2. In order to explain the observed behavior of IEP, we consider the roughness-induced self-overlap of the electrical double layers as a potential source of deviation from the trend expected for flat surfaces.
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页数:14
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