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In situ study of the high pressure high-temperature stability field of TaN and of the compressibilities of θ-TaN and TaON
被引:15
作者:
Friedrich, A.
[1
]
Morgenroth, W.
[1
]
Bayarjargal, L.
[1
]
Juarez-Arellano, E. A.
[2
]
Winkler, B.
[1
]
Konopkova, Z.
[3
]
机构:
[1] Goethe Univ Frankfurt, Abt Kristallog, Inst Geowissensch, D-60438 Frankfurt, Germany
[2] Univ Papaloapan, Inst Quim Aplicada, Tuxtepec 68301, Oaxaca, Mexico
[3] Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany
关键词:
high pressure;
tantalum nitride;
tantalum oxynitride;
X-ray diffraction;
laser-heated diamond anvil cell;
phase stability;
TANTALUM NITRIDE;
D O I:
10.1080/08957959.2013.813943
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
The high pressure high-temperature stability of tantalum mononitrides was investigated at 8-23.5GPa and 1400-3500K by in situ powder synchrotron X-ray diffraction using the laser-heated diamond anvil cell and E-TaN as starting material. The transformation from E-TaN to ?-TaN was observed and ?-TaN was confirmed as the stable high-(p, T) tantalum mononitride. At temperatures above 3000K at 16-23.5GPa, the formation of a novel quenchable high pressure high-temperature phase was observed. Under nitrogen excess E-TaN reacted with nitrogen to the high-(p, T) phase -Ta2N3 as the main stable phase at 8-13GPa and about 2000K. This behaviour is similar to the reaction of pure Ta with nitrogen at high-(p, T) conditions. In addition, we have determined the bulk moduli of ?-TaN (B=360(15)GPa), which is less compressible than E-TaN and -Ta2N3, and of TaON (B=267(8)GPa).
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页码:633 / 641
页数:9
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