Control of the Cation Stoichiometry in the Multiferroic BiFeO3 Thin Films

被引：4
|
作者：
Kartavtseva, M. S. [1 ,2 ]
Gorbenko, O. Yu. [1 ]
Kaul, A. R. [1 ]
Fusil, S. [2 ]
Barthelemy, A. [2 ]
Bouzehouane, K. [2 ]
机构：
[1] Moscow MV Lomonosov State Univ, Dept Chem, Moscow 119992, Russia
[2] CNRS, Unite Mixte Phys Thales, F-91767 Palaiseau, France
来源：
FERROELECTRICS | 2008年 / 374卷
关键词：
Piezoresponse Force Microscopy; isopiestic annealing; multiferroics; MOCVD;
D O I：
10.1080/00150190802424728
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The epitaxial BiFeO3 films on different substrates were prepared by metal organic chemical vapor deposition (MOCVD). The ferroelectric properties of the films were controlled by Piezoresponse Force Microscopy (PFM). The isopiestic post-annealing of the film inside the ceramic container made of BiFeO3 and Bi2Fe4O9 phase mixture was proposed to control the film stoichiometry.
引用
收藏
页码：164 / 169
页数：6
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