Application of white-light scanning interferometer on transparent thin-film measurement

被引：20

作者：

Li, Meng-Chi ^{[1
]}

Wan, Der-Shen ^{[1
]}

Lee, Cheng-Chung ^{[1
]}

机构：

[1] Natl Cent Univ, Thin Film Technol Ctr, Dept Opt & Photon, Chungli 320, Taiwan

来源：

APPLIED OPTICS | 2012年 / 51卷 / 36期

关键词：

INTERFERENCE MICROSCOPY; THICKNESS; ELLIPSOMETRY; SURFACES;

D O I：

10.1364/AO.51.008579

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A method to measure thin-film thickness, refractive index, and dispersion constants based on white-light interferometry is described. The thin-film property is retrieved from the Fourier amplitude of the white-light correlogram. The sources of errors in Fourier amplitude, which include the accuracy of wave number, light source variation in time, and illumination nonuniformity, are investigated. With all these errors reduced, the film thicknesses and refractive indices of four samples measured by white-light interferometry are within 1% of the ellipsometry results. (C) 2012 Optical Society of America

引用

页码：8579 / 8586

页数：8

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