Ion assisted deposition of α-Al2O3 coatings by anodic evaporation in the arc discharge

被引：31

作者：

Gavrilov, N. V. ^{[1
]}

Kamenetskikh, A. S. ^{[1
]}

Tretnikov, P. V. ^{[1
]}

Chukin, A. V. ^{[2
]}

机构：

[1] Russian Acad Sci, Inst Electrophys, Ural Branch, Amundsen St 106, Ekaterinburg 620016, Russia

[2] Ural Fed Univ, Mira St 19, Yekaterinbteg 620002, Russia

来源：

SURFACE & COATINGS TECHNOLOGY | 2018年 / 337卷

关键词：

alpha-Al2O3; coating; Reactive thermal evaporation; Ion assistance; Temperature; Cr2O3; sublayer; AL2O3; FILMS; THIN-FILMS; MICROSTRUCTURE; HARDNESS; MODEL;

D O I：

10.1016/j.surfcoat.2018.01.058

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Alumina coatings are deposited in an arc discharge by the method of reactive thermal anodic evaporation of aluminum with intensive ion assistance. The influence of the bias voltage and the ion current density on the structure and properties of the alpha-Al2O3 coatings, deposited on a stainless steel substrate with an isostructural Cr2O3 sublayer at 600 degrees C, was studied.

引用

页码：453 / 460

页数：8

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