Growth, real structure and applications of GaSel1-xSx crystals

被引:57
作者
Andreev, YM
Atuchin, VV [1 ]
Lanskii, GV
Morozov, AN
Pokrovsky, LD
Sarkisov, SY
Voevodina, OV
机构
[1] Russian Acad Sci, Inst Semicond Phys, Lab Opt Mat & Struct, Novosibirsk 630090, Russia
[2] Russian Acad Sci, Inst Monitoring Climat & Ecol Syst, Lab Ecol Instrument Making, Tomsk 634055, Russia
[3] Siberian Physico Tech Inst, Semicond Mat Sci Lab, Tomsk 634050, Russia
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2006年 / 128卷 / 1-3期
基金
俄罗斯基础研究基金会;
关键词
crystal growth; GaSe; doping; defect structure; cleaving;
D O I
10.1016/j.mseb.2005.12.012
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Real defect structure, growing technology and physical properties of doped GaSe:S crystals are presented. From comparative experiment on CO2 laser SHG at identical experimental conditions 1.45 times advantages of GaSe:S (2 wt%) in relation to pure and GaSe:In (0.1 wt%) crystals are developed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:205 / 210
页数:6
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