Fabrication of photonic crystals with functional defects by one-step holographic lithography

被引：52

作者：

Li, Juntao ^{[1
]}

Liu, Yikun ^{[1
]}

Xie, Xiangsheng ^{[1
]}

Zhang, Peiqing ^{[1
]}

Liang, Bing ^{[1
]}

Yan, Li ^{[1
]}

Zhou, Jianying ^{[1
]}

Kurizki, Gershon ^{[2
]}

Jacobs, Daniel ^{[2
]}

Wong, Kam Sing ^{[3
]}

Zhong, Yongchun ^{[3
]}

机构：

[1] Sun Yat Sen Univ, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Guangdong, Peoples R China

[2] Weizmann Inst Sci, Dept Chem Phys, IL-76100 Rehovot, Israel

[3] Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Hong Kong, Peoples R China

来源：

OPTICS EXPRESS | 2008年 / 16卷 / 17期

关键词：

D O I：

10.1364/OE.16.012899

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A one-step introduction of functional defects into a photonic crystal is demonstrated. By using a multi-beam phase-controlled holographic lithography, line-defects in a Bragg structure and embedded waveguides in a two-dimensional photonic crystal are fabricated. Intrinsic defect introduction into a 3-dimensional photonic crystal is also proposed. This technique gives rise to a substantial reduction of the fabrication complexity and a significant improvement on the accuracy of the functional defects in photonic crystals. (C) 2008 Optical Society of America.

引用

页码：12899 / 12904

页数：6

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