Thermal simulation of excimer Laser fusion and recrystallization of amorphous silicon for thin film transistors

被引：0

作者：

deUnamuno, S ^{[1
]}

Fogarassy, E ^{[1
]}

机构：

[1] LAB PHASE,CNRS,F-67037 STRASBOURG,FRANCE

来源：

ANNALES DE PHYSIQUE | 1997年 / 22卷

关键词：

D O I：

10.1051/anphys/1997043

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：225 / 226

页数：2

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