Thermal simulation of excimer Laser fusion and recrystallization of amorphous silicon for thin film transistors

被引：0
|
作者：
deUnamuno, S [1 ]
Fogarassy, E [1 ]
机构：
[1] LAB PHASE,CNRS,F-67037 STRASBOURG,FRANCE
来源：
ANNALES DE PHYSIQUE | 1997年 / 22卷
关键词：
D O I：
10.1051/anphys/1997043
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：225 / 226
页数：2
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