Transparent, non-fluorinated, hydrophobic silica coatings with improved mechanical properties
被引:37
作者:
Jeevajothi, K.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
CIPET, Dept Plast Technol, Plast Testing Ctr, Madras 600032, Tamil Nadu, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Jeevajothi, K.
[1
,2
]
Subasri, R.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Subasri, R.
[1
]
Raju, K. R. C. Soma
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Raju, K. R. C. Soma
[1
]
机构:
[1] Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
[2] CIPET, Dept Plast Technol, Plast Testing Ctr, Madras 600032, Tamil Nadu, India
Non-fluorinated, hydrophobic silica coatings were generated on soda lime glass substrates using dimethyldiethoxysilane (DMDEOS), tetraethoxysilane (TEOS) and a silylating agent hexamethyldisilazane (HMDS) using sol-gel process. To improve the mechanical properties of the coating, epoxy modified nanosilica particles were added to the sol of dimethyldiethoxysilane, tetraethoxysilane and hexamethyldisilazane followed by sonication prior to coating. Coatings were characterized for their water contact angles, thickness, UV-Vis transmission, pencil hardness and surface morphology. The concentrations of the nanosilica particles as well as the sonication times were optimized to obtain a transparent, hydrophobic coating with improved pencil scratch hardness. An optimized coating composition with 1: 0.5 M ratio of the nanosilica particles and sol synthesized from DMDEOS, TEOS and HMDS sonicated for 60 min yielded coatings that exhibited a water contact angle of 125 +/- 2 degrees with a pencil scratch hardness of HB and average visible light transmittance of 89%. (C) 2012 Elsevier Ltd and Techna Group S.r.l. All rights reserved.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Jeevajothi, K.
;
Crossiya, D.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Crossiya, D.
;
Subasri, R.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
机构:
Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Park, Hoy Yul
;
Kang, Dong Pil
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Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Kang, Dong Pil
;
Na, Moon Kyong
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Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Na, Moon Kyong
;
Lee, Hee Woong
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Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Lee, Hee Woong
;
Lee, Hyeon Hwa
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Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Lee, Hyeon Hwa
;
Shin, Dong Soo
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Changwon Natl Univ, Coll Nat Sci, Dept Chem, Chang Won 641773, Gyeongnam, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Jeevajothi, K.
;
Crossiya, D.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
Crossiya, D.
;
Subasri, R.
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Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, IndiaInt Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad 500005, Andhra Pradesh, India
机构:
Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Park, Hoy Yul
;
Kang, Dong Pil
论文数: 0引用数: 0
h-index: 0
机构:
Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Kang, Dong Pil
;
Na, Moon Kyong
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Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Na, Moon Kyong
;
Lee, Hee Woong
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机构:
Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Lee, Hee Woong
;
Lee, Hyeon Hwa
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机构:
Korea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea
Lee, Hyeon Hwa
;
Shin, Dong Soo
论文数: 0引用数: 0
h-index: 0
机构:
Changwon Natl Univ, Coll Nat Sci, Dept Chem, Chang Won 641773, Gyeongnam, South KoreaKorea Electrotechnol Res Inst, Applicat Res Div, Chang Won 641600, South Korea