Evaluation of Atomic Layer Deposition coating as gas barrier against hydrogen gas and humidity

被引：6
作者：
Heidary, Damoon Sohrabi Baba [1 ]
Randall, Clive A. [1 ]
机构：
[1] Penn State Univ, Ctr Dielect & Piezoelect, Mat Res Inst, University Pk, PA 16802 USA
来源：
SCRIPTA MATERIALIA | 2015年 / 107卷
基金：
美国国家科学基金会;
关键词：
Atomic Layer Deposition; Gas barrier; Hydrogen degradation; Varistor; Diffusion; ZINC-OXIDE; ZNO; DIFFUSION; SPECTROSCOPY; IMPEDANCE; STRATEGY; MODEL;
D O I：
10.1016/j.scriptamat.2015.05.013
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
Effectiveness of HfO2 Atomic Layer Deposition coatings has been studied on ZnO varistors by I-V tests, impedance spectroscopy, and highly accelerated life test. Based on impedance spectroscopy analyses, the proton diffusion coefficient was measured to be 400 K times less in the coating. Transmission electron microscopy analysis shows that Atomic Layer Deposition films are continuous and conformal. After exposure to high temperature, partial crystallization was detected in the coating and increases proton diffusion coefficient by 150 times. (C) 2015 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码：30 / 33
页数：4
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