Residual stress of graded-index-like films deposited by radio frequency ion-beam sputtering

被引：7

作者：

Tang, Chien-Jen ^{[1
]}

Jaing, Cheng-Chung ^{[2
]}

Wu, Kai ^{[1
]}

Lee, Cheng-Chung ^{[1
]}

机构：

[1] Natl Cent Univ, Thin Film Technol Ctr, Dept Opt & Photon, Chungli 320, Taiwan

[2] Minghsin Univ Sci & Technol, Dept Optoelect Syst Engn, Hsinchu 304, Taiwan

来源：

THIN SOLID FILMS | 2009年 / 517卷 / 05期

关键词：

Ta2O5-SiO2 composite film; Graded-index optical filters; Radio frequency ion-beam sputtering; Residual stress; COMPOSITE THIN-FILMS; OXIDE-FILMS; INTRINSIC STRESS; INTERNAL-STRESS; COEVAPORATION; GROWTH;

D O I：

10.1016/j.tsf.2008.09.073

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this study, Ta2O5-SiO2 Composite films with various proportions of Ta2O5 were prepared by radio frequency ion-beam sputtering deposition. The residual stress of each composite film was analyzed. The residual stresses of different graded-index-like layers made of composite films were studied. The results show that the residual stress of a single layered composite film was lower than that of pure SiO2 or a pure Ta2O5 film. Furthermore, when the composite film was made graded-index-like, the residual stress was reduced. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1746 / 1749

页数：4

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