Properties of cobalt-doped YBa2Cu3O7-delta thin films

被引:24
作者
Moeckly, B
Char, K
机构
[1] Conductus, Inc., Sunnyvale, CA 94086
来源
PHYSICA C | 1996年 / 265卷 / 3-4期
关键词
D O I
10.1016/0921-4534(96)00330-9
中图分类号
O59 [应用物理学];
学科分类号
摘要
We show that the properties of YBa2(Cu1-xCox)(3)O-7-delta films (x = 0 to 0.14) deposited by pulsed laser ablation are sensitive to the growth conditions. We describe the behavior of T-c, rho(T), J(c)(T), and X-ray measurements as a function of cobalt content and deposition parameters. Over a range of deposition parameters for which these properties of undoped YBa2Cu3O7-delta are hardly altered, the values for cobalt-doped films may vary greatly.
引用
收藏
页码:283 / 294
页数:12
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