Use of the Indirect Photoluminescence Peak as an Optical Probe of Interface Defectivity in MoS2

被引:14
作者
Leonhardt, Alessandra [1 ,2 ]
de la Rosa, Cesar Javier Lockhart [2 ]
Nuytten, Thomas [2 ]
Banszerus, Luca [4 ]
Sergeant, Stefanie [2 ]
Mootheri, Vivek K. [2 ,3 ]
Taniguchi, Takashi [5 ]
Watanabe, Kenji [5 ]
Stampfer, Christoph [4 ]
Huyghebaert, Cedric [2 ]
De Gendt, Stefan [1 ,2 ]
机构
[1] Katholieke Univ Leuven, Dept Chem, Celestijnenlaan 200F,2404, B-3001 Leuven, Belgium
[2] IMEC, Kapeldreef 75, B-3001 Leuven, Belgium
[3] Katholieke Univ Leuven, Dept Mat MTM, Kasteelpk Arenberg 44,2450, B-3001 Leuven, Belgium
[4] Rhein Westfal TH Aachen, Inst Phys 2, D-52074 Germany, Germany
[5] Natl Inst Mat Sci, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
基金
欧盟地平线“2020”;
关键词
characterization; hBN; interfaces; MoS2; photoluminescence; traps; EXCITON DYNAMICS; MONOLAYER MOS2; MONO LAYER; GRAPHENE; RECOMBINATION; HETEROSTRUCTURES;
D O I
10.1002/admi.202000413
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Defect characterization of 2D materials is a critical aspect for their successful integration in future electronic devices. Here, a simple characterization technique is proposed that opens a path for fast, non-invasive, quality assessment of transition metal dichalcogenide layers, such as MoS2, and their interfaces. It relates to the correlation between substrate-induced traps and the indirect-to-direct photoluminescence peak ratio. It is shown that the indirect peak is quenched when interfacial trap sites are present. A physical mechanism is proposed to explain the observations based on different recombination mechanisms.
引用
收藏
页数:8
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