Study of nucleation positions of InAs islands on stripe-patterned GaAs(100) substrate

被引:5
|
作者
Cui, CX [1 ]
Chen, YH [1 ]
Jin, P [1 ]
Xu, B [1 ]
Ren, YY [1 ]
Zhao, C [1 ]
Wang, ZG [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Lab Semicond Mat Sci, Beijing 100083, Peoples R China
来源
PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2006年 / 31卷 / 01期
基金
中国国家自然科学基金;
关键词
patterned substrate; GaAs; molecular beam epitaxy; nucleation positions;
D O I
10.1016/j.physe.2005.09.006
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
By combination of prepatterned substrate and self-organized growth, InAs islands are grown on the stripe-patterned GaAs (100) substrate by solid soul-cc molecular beam epitaxy. Four [011] stripe-patterned substrates different in pitch, depth, and sidewall angle, respectively, are used in this work. The surface morphology obtained by atomic force microscopy shows that the InAs quantum dots can be formed either on the ridge or on the sidewall of the stripes near the bottom, depending on the structure of the stripes on the patterned substrate. The mechanism determining the nucleation position of the InAs dots is discussed. The optical properties of the InAs dots on the patterned substrates are also investigated by photo luminescence. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:43 / 47
页数:5
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