Formation of three-dimensional carbon microstructures via two-photon microfabrication and microtransfer molding

被引:25
作者
Daicho, Yuya [1 ,2 ]
Murakami, Terumasa [1 ]
Hagiwara, Tsuneo [3 ]
Maruo, Shoji [1 ]
机构
[1] Yokohama Natl Univ, Dept Mech Engn, Grad Sch Engn, Hodogaya Ku, Yokohama, Kanagawa 2408501, Japan
[2] C MET Inc, Kohoku Ku, Yokohama, Kanagawa 2220033, Japan
[3] Tokyo Inst Technol, Grad Sch Sci & Engn, Dept Organ & Polymer Mat, Meguro Ku, Tokyo 1528550, Japan
关键词
MICROELECTROMECHANICAL SYSTEMS; AMORPHOUS-CARBON; FABRICATION; PHOTORESIST; MEMS; DIAMOND; FILMS;
D O I
10.1364/OME.3.000875
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We developed new photopolymers for use in the formation of three-dimensional (3-D) carbon microstructures via two-photon microfabrication and microtransfer molding. The photopolymers contain the epoxy resorcinol diglycidyl ether. They have a high carbon content and a high bond energy, ensuring structural fidelity of the microstructures after pyrolysis. A cationic photoinitiator is incorporated into one of the new photopolymers and an additional radical photoinitiator into another. These two photopolymers are found to be ideal for two-photon microfabrication and microtransfer molding, respectively, with complex 3-D carbon microstructures such as a bunny and pyramidal models being formed. Potential applications of the new photopolymers include 3-D carbon electrodes for fuel cells or batteries and interfaces for biosensors. (C) 2013 Optical Society of America
引用
收藏
页码:875 / 883
页数:9
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