Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation

被引：86

作者：

Kalaj, Mark ^{[1
]}

Momeni, Mohammad R. ^{[1
]}

Bentz, Kyle C. ^{[1
]}

Barcus, Kyle S. ^{[1
]}

Palomba, Joseph M. ^{[1
]}

Paesani, Francesco ^{[1
]}

Cohen, Seth M. ^{[1
]}

机构：

[1] Univ Calif San Diego, Dept Chem & Biochem, La Jolla, CA 92023 USA

来源：

CHEMICAL COMMUNICATIONS | 2019年 / 55卷 / 24期

基金：

美国国家科学基金会;

关键词：

ENHANCED RAMAN-SCATTERING; METAL-ORGANIC FRAMEWORKS; CATALYTIC HYDROLYSIS; DESIGN; REMOVAL;

D O I：

10.1039/c9cc00642g

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Herein, a series of halogenated UiO-66 derivatives was synthesized and analyzed for the breakdown of the chemical warfare agent simulant dimethyl-4-nitrophenyl phosphate (DMNP) to analyze ligand effects. UiO-66-I degrades DMNP at a rate four times faster than the most active previously reported MOFs. MOF defects were quantified and ruled out as a cause for increased activity. Theoretical calculations suggest the enhanced activity of UiO-66-I originates from halogen bonding of the iodine atom to the phosphoester linkage allowing for more rapid hydrolysis of the P-O bond.

引用

页码：3481 / 3484

页数：4

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