Halogen bonding in UiO-66 frameworks promotes superior chemical warfare agent simulant degradation

被引:79
|
作者
Kalaj, Mark [1 ]
Momeni, Mohammad R. [1 ]
Bentz, Kyle C. [1 ]
Barcus, Kyle S. [1 ]
Palomba, Joseph M. [1 ]
Paesani, Francesco [1 ]
Cohen, Seth M. [1 ]
机构
[1] Univ Calif San Diego, Dept Chem & Biochem, La Jolla, CA 92023 USA
基金
美国国家科学基金会;
关键词
ENHANCED RAMAN-SCATTERING; METAL-ORGANIC FRAMEWORKS; CATALYTIC HYDROLYSIS; DESIGN; REMOVAL;
D O I
10.1039/c9cc00642g
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Herein, a series of halogenated UiO-66 derivatives was synthesized and analyzed for the breakdown of the chemical warfare agent simulant dimethyl-4-nitrophenyl phosphate (DMNP) to analyze ligand effects. UiO-66-I degrades DMNP at a rate four times faster than the most active previously reported MOFs. MOF defects were quantified and ruled out as a cause for increased activity. Theoretical calculations suggest the enhanced activity of UiO-66-I originates from halogen bonding of the iodine atom to the phosphoester linkage allowing for more rapid hydrolysis of the P-O bond.
引用
收藏
页码:3481 / 3484
页数:4
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