MACRODROPLET REDUCTION AND GROWTH MECHANISMS IN CATHODIC ARC PHYSICAL VAPOR DEPOSITION OF TiN FILMS

被引：14

作者：

Ali, Mubarak ^{[1
]}

Hamzah, Esah ^{[2
]}

Abbas, Tahir ^{[3
]}

Toff, Mohd Radzi Hj. Mohd ^{[4
]}

Qazi, Ishtiaq A. ^{[5
]}

机构：

[1] COMSATS Inst Informat Technol, Dept Phys, Islamabad, Pakistan

[2] Univ Teknol Malaysia, Fac Mech Engn, Skudai 81310, Johor, Malaysia

[3] Bahauddin Zakariya Univ, Dept Phys, Multan 60800, Pakistan

[4] Adv Mat Res Ctr AMREC, SIRIM Berhad, Kulim 09000, Kedah, Malaysia

[5] Natl Univ Sci & Technol, Rawalpindi, Pakistan

来源：

SURFACE REVIEW AND LETTERS | 2008年 / 15卷 / 05期

关键词：

Cathodic arc; PVD; TiN; macrodroplets; morphology; surface roughness;

D O I：

10.1142/S0218625X08011810

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Cathodic arc physical vapor deposition (CAPVD) a technique used for the deposition of hard coatings for tooling applications has many advantages. The main drawback of this technique is the formation of macrodroplets (MDs) during deposition resulting in films with rougher morphology. The MDs contamination and growth mechanisms was investigated in TiN coatings over high-speed steel, as a function of metal ion etching, substrate bias, and nitrogen gas flow rate; it was observed that the latter is the most important factor in controlling the size and number of the macrodroplets.

引用

页码：653 / 659

页数：7

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