Effects of silicon plasma ion implantation on electrochemical corrosion behavior of biodegradable Mg-Y-RE Alloy

被引:68
作者
Jamesh, M. [1 ]
Wu, Guosong [1 ]
Zhao, Ying [1 ]
Chu, Paul K. [1 ]
机构
[1] City Univ Hong Kong, Dept Phys & Mat Sci, Kowloon, Hong Kong, Peoples R China
关键词
Magnesium; AFM; EIS; XPS; Ion implantation; MICRO-ARC OXIDATION; MAGNESIUM ALLOY; DEGRADATION BEHAVIOR; BIOMEDICAL MAGNESIUM; PURE MAGNESIUM; COATINGS; RESISTANCE; CHROMIUM; STENTS; METAL;
D O I
10.1016/j.corsci.2012.11.037
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Rapid degradation is the major obstacle hindering a wider use of magnesium based biomaterials. In this work, silicon, one of the essential elements in the bone tissues, is implanted into WE43 magnesium alloy to improve its corrosion behavior. X-ray photoelectron spectroscopy (XPS) reveals the formation of a gradient surface structure with a gradual transition from a Si-rich oxide layer to Si-rich layer. Electrochemical studies reveal that Si implantation offers a remarkable improvement in the corrosion resistance of WE43 Mg alloy in simulated body fluid (SBF). (C) 2012 Elsevier Ltd. All rights reserved.
引用
收藏
页码:158 / 163
页数:6
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