Observation of temperature effect on electrical properties of novel Au/Bi0.7Dy0.3FeO3/ZnO/p-Si thin film MIS capacitor for MEMS applications

被引:2
作者
Bhatia, Deepak [1 ,2 ]
Roy, Sandipta [3 ]
Nawaz, S. [3 ]
Meena, R. S. [4 ]
Palkar, V. R. [1 ,2 ]
机构
[1] Indian Inst Technol, Dept Elect Engn, Bombay 400076, Maharashtra, India
[2] Indian Inst Technol, Ctr Excellence Nanoelect, Bombay 400076, Maharashtra, India
[3] Indian Inst Technol, Ctr Res Nanotechnol & Sci, Bombay 400076, Maharashtra, India
[4] Rajasthan Tech Univ, Dept Elect Engn, Kota 324010, India
关键词
BDFO/ZnO; PLD; Multiferroic; Ideality factor; Barrier height; MOS STRUCTURES; ZNO FILMS; INTEGRATION; DEVICES; SILICON; DIODES; SI;
D O I
10.1016/j.mee.2016.11.001
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work thedependence of electrical properties on operation temperature (27 degrees C to 200 degrees C) of Au-Cr/Bi0.7Dy0.3FeO3 (BDFO)/ZnO/p-Si (MIS device) are discussed. The thin film of BDFO was deposited by pulsed laser deposition (PLD) on p-Si. From the electrical characterization, the devices properties like ideality factor (eta), barrier height) (BH) of Au-Cr/BDFO/ZnO/p-Si MIS were determined. The values of eta and BH were found to be 134.and 0.86 eV at 200 degrees C and 2.16 and 0.30 eV; respectively, at room temperature (27 degrees C). The leakage current conduction mechanism of the device was investigated and found to be Schottky emission (SE) in the low electric field (<0.92 MV cm(-1)) regime and trap assisted Poole-Frenkel (PF) mechanism for high electric field regime. The coexistence of ferroelectric and ferromagnetic coupling and excellent dielectric properties in multiferroic BDFO offers potential in the field of memory devices; sensing and energy harvesting (cantilevers). (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:55 / 61
页数:7
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