Physical Origin of the Gate Current Surge During Short-Circuit Operation of SiC MOSFET

被引:24
|
作者
Boige, F. [1 ]
Tremouilles, D. [2 ]
Richardeau, F. [1 ]
机构
[1] Univ Toulouse, CNRS, INPT, UPS,LAPLACE Lab, F-31000 Toulouse, France
[2] Univ Toulouse, CNRS, LAAS, F-31000 Toulouse, France
关键词
4H-SiC MOSFET; short-circuit; gate oxide; Schottky emission; Fowler-Nordheim; TEMPERATURE-DEPENDENCE; OXIDE; PLANAR; DEVICES;
D O I
10.1109/LED.2019.2896939
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
During the short circuit of a vertical 4H-SiC power MOSFET, a high gate current starts to flow through the gate dielectric. We demonstrate that the Schottky emission is the main physical mechanisms.
引用
收藏
页码:666 / 669
页数:4
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