Control of plasma density distribution via wireless power transfer in an inductively coupled plasma

被引:7
|
作者
Lee, Hee-Jin [1 ]
Lee, Hyo-Chang [1 ]
Kim, Young-Cheol [1 ]
Chung, Chin-Wook [1 ]
机构
[1] Hanyang Univ, Dept Elect Engn, Seoul 133791, South Korea
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2013年 / 22卷 / 03期
基金
新加坡国家研究基金会;
关键词
ANTENNA;
D O I
10.1088/0963-0252/22/3/032002
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
With an enlargement of the wafer size, development of large-area plasma sources and control of plasma density distribution are required. To control the spatial distribution of the plasma density, wireless power transfer is applied to an inductively coupled plasma for the first time. An inner powered antenna and an outer resonant coil connected to a variable capacitor are placed on the top of the chamber. As the self-resonance frequency omega(r) of the resonant coil is adjusted, the power transfer rate from the inner powered coil to the outer resonant coil is changed and the dramatic evolution of the plasma density profile is measured. As omega(r) of the outer resonant coil changes from the non-resonant condition (where omega(r) is not the driving angular frequency omega(rf)) to the resonant condition (where omega(r) = omega(rf)), the plasma density profile evolves from a convex shape with maximal plasma density at the radial center into a concave shape with maximal plasma density in the vicinity of the resonant antenna coil. This result shows that the plasma density distribution can be successfully controlled via wireless resonance power transfer.
引用
收藏
页数:5
相关论文
共 50 条
  • [31] CHARACTERISTICS OF INDUCTIVELY COUPLED PLASMA IN DIFFERENT POWER AND PRESSURE
    Lei Fan
    Li Xiaoping
    Liu Yanming
    Liu Donglin
    Zhang Jia
    Liu Xiaotao
    2017 IEEE INTERNATIONAL CONFERENCE ON PLASMA SCIENCE (ICOPS), 2017,
  • [32] Power absorption characteristics of an inductively coupled plasma discharge
    Yang, JG
    Yoon, NS
    Kim, BC
    Choi, JH
    Lee, GS
    Hwang, SM
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 1999, 27 (03) : 676 - 681
  • [33] Power deposition profiles in magnetized inductively coupled plasma
    Lee, Ho-Jun
    Lee, Hae June
    Lim, Wang Sun
    Whang, Ki-Woong
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2008, 36 (04) : 1394 - 1395
  • [34] Plasma density monitoring based on the capacitively- and inductively-coupled-plasma models
    Lee, Seok-Hwan
    Kim, Gon-Ho
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2006, 49 : S726 - S731
  • [35] SPATIAL PROFILES OF ELECTRON-DENSITY IN THE INDUCTIVELY COUPLED PLASMA
    CAUGHLIN, BL
    BLADES, MW
    SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 1985, 40 (07) : 987 - 993
  • [36] Stability and control of inductively coupled power transfer systems
    Boys, JT
    Covic, GA
    Green, AW
    IEE PROCEEDINGS-ELECTRIC POWER APPLICATIONS, 2000, 147 (01): : 37 - 43
  • [37] THE SPATIAL-DISTRIBUTION OF EXCITATION TEMPERATURE AND ELECTRON-DENSITY IN AN INDUCTIVELY COUPLED ARGON PLASMA
    JOSHI, NK
    THIAGARAJAN, TK
    ROHATGI, VK
    ASHTAMOORTHY, TS
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1988, 21 (07) : 1121 - 1124
  • [38] Electron temperature and ion density distribution on a vertical section in a weakly magnetized inductively coupled plasma
    He, You
    Jiang, Yi-Lang
    Lee, Myoung-Jae
    Seo, Beom-Jun
    Kim, Ju-Ho
    Chung, Chin-Wook
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2024, 42 (06):
  • [39] ELECTRON-DENSITY AND HYDROGEN DISTRIBUTION IN AN ETHANOL-LOADED INDUCTIVELY-COUPLED PLASMA
    MCCRINDLE, RI
    RADEMEYER, CJ
    JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 1994, 9 (10) : 1087 - 1091
  • [40] Influence of different coil geometries on the spatial distribution of the plasma density in planar inductively coupled plasmas
    Schwabedissen, A.
    Benck, E.C.
    Roberts, J.R.
    Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics, 1997, 56 (5 -B pt B): : 5866 - 5875