共 50 条
- [4] Feedback control of plasma electron density and ion energy in an inductively coupled plasma etcher JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2009, 27 (01): : 157 - 164
- [5] Measurement of plasma density for control of etching profile in inductively coupled plasma etching of InP JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (5A): : 3147 - 3148
- [7] Measurement of plasma density for control of etching profile in inductively coupled plasma etching of InP Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (5 A): : 3147 - 3148
- [8] Control of electron and ion density profiles via virtual ground position control in an inductively coupled plasma Chung, Chin-Wook (joykang@hanyang.ac.kr), 1600, American Institute of Physics Inc. (27):
- [9] Electron density and hydrogen distribution in an ethanol-loaded inductively coupled plasma 1600, Royal Soc of Chemistry, Letchworth, Engl (09):