Oxidation of nanostructured Ti films produced by low energy cluster beam deposition: An X-ray Photoelectron Spectroscopy characterization

被引：5

作者：

de Simone, Monica ^{[1
]}

Snidero, Elena ^{[1
]}

Coreno, Marcello ^{[2
,5
]}

Bongiorno, Gero ^{[3
]}

Giorgetti, Luca ^{[4
]}

Amati, Matteo ^{[5
]}

Cepek, Cinzia ^{[1
]}

机构：

[1] CNR IOM, Lab TASC, I-34149 Trieste, Italy

[2] CNR IMIP, Lab TASC, I-34149 Trieste, Italy

[3] Fdn Filarete, I-20139 Milan, Italy

[4] Ist Europeo Oncol, Dip Oncol Sperimentale, I-20139 Milan, Italy

[5] Sincrotrone Trieste ScpA, I-34149 Trieste, Italy

来源：

THIN SOLID FILMS | 2012年 / 520卷 / 14期

关键词：

Nanostructures; Low energy cluster beam deposition; X-ray Photoelectron Spectroscopy (XPS); Oxidation; AUGER-ELECTRON-SPECTROSCOPY; TITANIUM OXIDATION; OXYGEN; STOICHIOMETRY; TEMPERATURE; ADSORPTION; KINETICS; SURFACE;

D O I：

10.1016/j.tsf.2011.10.075

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We used in-situ X-ray Photoelectron Spectroscopy (XPS) to study the oxidation process of a cluster-assembled metallic titanium film exposed to molecular oxygen at room temperature. The nanostructured film has been grown on a Si(111) substrate, in ultra high vacuum conditions, by coupling a supersonic cluster beam deposition system with an XPS experimental chamber. Our results show that upon in-situ oxygen exposure Ti3+ is the first oxidation state observed, followed by Ti4+, whereas Ti2+ is practically absent during the whole process. Our results compare well with the existing literature on Ti films produced using other techniques. (C) 2011 Elsevier B.V. All rights reserved.

引用

页码：4803 / 4807

页数：5

共 30 条

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