Screening limited switching performance of multilayer 2D semiconductor FETs: the case for SnS

被引:70
作者
Sucharitakul, Sukrit [1 ]
Kumar, U. Rajesh [2 ,3 ]
Sankar, Raman [4 ,5 ]
Chou, Fang-Cheng [4 ]
Chen, Yit-Tsong [2 ,3 ]
Wang, Chuhan [6 ]
He, Cai [6 ]
He, Rui [6 ]
Gao, Xuan P. A. [1 ]
机构
[1] Case Western Reserve Univ, Dept Phys, Cleveland, OH 44106 USA
[2] Natl Taiwan Univ, Dept Chem, Taipei 10617, Taiwan
[3] Acad Sinica, Inst Atom & Mol Sci, Taipei 10617, Taiwan
[4] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 10617, Taiwan
[5] Acad Sinica, Inst Phys, Taipei 11529, Taiwan
[6] Univ Northern Iowa, Dept Phys, Cedar Falls, IA 50614 USA
基金
美国国家科学基金会;
关键词
FIELD-EFFECT TRANSISTORS; TRANSITION-METAL DICHALCOGENIDES; BLACK PHOSPHORUS; MOS2; TRANSISTORS; MOBILITY; OPTOELECTRONICS; GRAPHENE; FILMS; HALL;
D O I
10.1039/c6nr07098a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Gate tunable p-type multilayer tin mono-sulfide (SnS) field-effect transistor (FET) devices with SnS thickness between 50 and 100 nm were fabricated and studied to understand their performance. The devices showed anisotropic inplane conductance and room temperature field effect mobilities similar to 5-10 cm(2) V-1 s(-1). However, the devices showed an ON-OFF ratio similar to 10 at room temperature due to appreciable OFF state conductance. The weak gate tuning behavior and finite OFF state conductance in the depletion regime of SnS devices are explained by the finite carrier screening length effect which causes the existence of a conductive surface layer from defect induced holes in SnS. Through etching and n-type surface doping by Cs2CO3 to reduce/compensate the not-gatable holes near the SnS flake's top surface, the devices exhibited an order of magnitude improvement in the ON-OFF ratio, and a hole Hall mobility of similar to 100 cm(2) V-1 s(-1) at room temperature is observed. This work suggests that in order to obtain effective switching and low OFF state power consumption, two-dimensional (2D) semiconductor based depletion mode FETs should limit their thickness to within the Debye screening length of the carriers in the semiconductor.
引用
收藏
页码:19050 / 19057
页数:8
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