Design rules for field plate edge termination in SiC Schottky diodes

被引:74
作者
Tarplee, MC [1 ]
Madangarli, VP
Zhang, QC
Sudarshan, TS
机构
[1] Univ S Carolina, Dept Elect Engn, Columbia, SC 29208 USA
[2] York Tech Coll, Rock Hill, SC 29730 USA
[3] TestChip Technol Inc, Plano, TX 75074 USA
关键词
avalanche breakdown; edge termination; field plate; Schottky diode;
D O I
10.1109/16.974686
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Practical design of silicon carbide (SiC) Schottky diodes incorporating a field plate necessitates an understanding of how the addition of the field plate affects the performance parameters and the relationship between the diode structure and diode performance. In this paper, design rules are presented for SiC Schottky diodes that incorporate field plate edge termination. The use of an appropriate field plate edge termination can improve the reverse breakdown voltage of a SiC Schottky diode by a factor of two. Reverse breakdown voltage values can be obtained that are up to 88% of the theoretical maximums.
引用
收藏
页码:2659 / 2664
页数:6
相关论文
共 12 条
[1]   SiC device edge termination using finite area argon implantation [J].
Alok, D ;
Baliga, BJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1997, 44 (06) :1013-1017
[2]   A SIMPLE EDGE TERMINATION FOR SILICON-CARBIDE DEVICES WITH NEARLY IDEAL BREAKDOWN VOLTAGE [J].
ALOK, D ;
BALIGA, BJ ;
MCLARTY, PK .
IEEE ELECTRON DEVICE LETTERS, 1994, 15 (10) :394-395
[3]  
Baliga J., 1996, POWER SEMICONDUCTOR
[4]   Medici simulation of 6H-SiC oxide ramp profile Schottky structure [J].
Brezeanu, G ;
Fernandez, J ;
Millan, J ;
Badila, M ;
Dilimot, G .
SILICON CARBIDE, III-NITRIDES AND RELATED MATERIALS, PTS 1 AND 2, 1998, 264-2 :941-944
[5]   2000-V 6H-SIC P-N-JUNCTION DIODES GROWN BY CHEMICAL-VAPOR-DEPOSITION [J].
NEUDECK, PG ;
LARKIN, DJ ;
POWELL, JA ;
MATUS, LG ;
SALUPO, CS .
APPLIED PHYSICS LETTERS, 1994, 64 (11) :1386-1388
[6]   The response of high voltage 4H-SiC p-n junction diodes to different edge termination techniques [J].
Oder, TN ;
Tin, CC ;
Williams, JR ;
Isaacs-Smith, T ;
Madangarli, V ;
Sudarshan, TS .
WIDE-BANDGAP SEMICONDUCTORS FOR HIGH POWER, HIGH FREQUENCY AND HIGH TEMPERATURE, 1998, 512 :101-106
[7]  
Ortolland S, 1997, J PHYS III, V7, P809, DOI 10.1051/jp3:1997156
[8]   High-voltage Ni- and Pt-SiC Schottky diodes utilizing metal field plate termination [J].
Saxena, V ;
Su, JN ;
Steckl, AJ .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (03) :456-464
[9]   Design considerations and experimental analysis of high-voltage SiC Schottky barrier rectifiers [J].
Schoen, KJ ;
Woodall, JM ;
Cooper, JA ;
Melloch, MR .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (07) :1595-1604
[10]  
SHUR M, 1990, PHYSICS SEMICONDUCTO